R. W. K. Leung, Henry C. W. Lau, C. K. Kwong. An Intelligent System to Monitor the Chemical Concentration of Electroplating Process: An Integrated OLAP and Fuzzy Logic Approach. Artif. Intell. Rev., 21(2):139-159, 2004. [doi]
@article{LeungLK04,
title = {An Intelligent System to Monitor the Chemical Concentration of Electroplating Process: An Integrated OLAP and Fuzzy Logic Approach},
author = {R. W. K. Leung and Henry C. W. Lau and C. K. Kwong},
year = {2004},
doi = {10.1023/B:AIRE.0000020937.82267.32},
url = {http://dx.doi.org/10.1023/B:AIRE.0000020937.82267.32},
tags = {process monitoring, C++, logic, systematic-approach},
researchr = {https://researchr.org/publication/LeungLK04},
cites = {0},
citedby = {0},
journal = {Artif. Intell. Rev.},
volume = {21},
number = {2},
pages = {139-159},
}