Yuan Li, Klaas Jelle Veenstra, Jerôme Dubois, Lei Peters-Wu, Agnes van Zomeren, Fred G. Kuper. Reservoir effect and maximum allowed VIA misalignment for AlCu interconnect with tungsten VIA plug. Microelectronics Reliability, 43(9-11):1449-1454, 2003. [doi]
Abstract is missing.