Two-Stage Layout Decomposition for Hybrid E-Beam and Triple Patterning Lithography

Xingquan Li, Wenxing Zhu. Two-Stage Layout Decomposition for Hybrid E-Beam and Triple Patterning Lithography. ACM Trans. Design Autom. Electr. Syst., 23(1), 2017. [doi]

Abstract

Abstract is missing.