A virtual metrology approach for maintenance compensation to improve yield in semiconductor manufacturing

Kuo-Yi Lin, Chia-Yu Hsu, Hui-Chun Yu. A virtual metrology approach for maintenance compensation to improve yield in semiconductor manufacturing. Int. J. Computational Intelligence Systems, 7(sup2):66-73, 2014. [doi]

@article{LinHY14,
  title = {A virtual metrology approach for maintenance compensation to improve yield in semiconductor manufacturing},
  author = {Kuo-Yi Lin and Chia-Yu Hsu and Hui-Chun Yu},
  year = {2014},
  doi = {10.1080/18756891.2014.947116},
  url = {http://dx.doi.org/10.1080/18756891.2014.947116},
  researchr = {https://researchr.org/publication/LinHY14},
  cites = {0},
  citedby = {0},
  journal = {Int. J. Computational Intelligence Systems},
  volume = {7},
  number = {sup2},
  pages = {66-73},
}