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Throughput comparison of multi-exposure and multi-beam laser interference lithography on nano patterned sapphire substrate process

T. Lin, T. Huang, Y. Yang, K. Tseng, C. Fu. Throughput comparison of multi-exposure and multi-beam laser interference lithography on nano patterned sapphire substrate process. In 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2014, Waikiki Beach, HI, USA, April 13-16, 2014. pages 555-559, IEEE, 2014. [doi]

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T. Lin

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T. Huang

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Y. Yang

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K. Tseng

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C. Fu

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