T. Lin, T. Huang, Y. Yang, K. Tseng, C. Fu. Throughput comparison of multi-exposure and multi-beam laser interference lithography on nano patterned sapphire substrate process. In 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2014, Waikiki Beach, HI, USA, April 13-16, 2014. pages 555-559, IEEE, 2014. [doi]
@inproceedings{LinHYTF14,
title = {Throughput comparison of multi-exposure and multi-beam laser interference lithography on nano patterned sapphire substrate process},
author = {T. Lin and T. Huang and Y. Yang and K. Tseng and C. Fu},
year = {2014},
doi = {10.1109/NEMS.2014.6908873},
url = {https://doi.org/10.1109/NEMS.2014.6908873},
researchr = {https://researchr.org/publication/LinHYTF14},
cites = {0},
citedby = {0},
pages = {555-559},
booktitle = {9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2014, Waikiki Beach, HI, USA, April 13-16, 2014},
publisher = {IEEE},
isbn = {978-1-4799-4726-3},
}