Novel Guiding Template and Mask Assignment for DSA-MP Hybrid Lithography Using Multiple BCP Materials

Yi-Ting Lin, Iris Hui-Ru Jiang. Novel Guiding Template and Mask Assignment for DSA-MP Hybrid Lithography Using Multiple BCP Materials. IEEE Trans. on CAD of Integrated Circuits and Systems, 40(9):1909-1919, 2021. [doi]

Authors

Yi-Ting Lin

This author has not been identified. Look up 'Yi-Ting Lin' in Google

Iris Hui-Ru Jiang

This author has not been identified. Look up 'Iris Hui-Ru Jiang' in Google