Progress and outlook of lithography for semiconductor IC

Burn J. Lin, R. G. Liu. Progress and outlook of lithography for semiconductor IC. In IEEE Custom Integrated Circuits Conference, CICC 2009, San Jose, California, USA, 13-16 September, 2009, Proceedings. pages 133-140, IEEE, 2009. [doi]

Authors

Burn J. Lin

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R. G. Liu

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