Burn J. Lin, R. G. Liu. Progress and outlook of lithography for semiconductor IC. In IEEE Custom Integrated Circuits Conference, CICC 2009, San Jose, California, USA, 13-16 September, 2009, Proceedings. pages 133-140, IEEE, 2009. [doi]
@inproceedings{LinL09-31,
title = {Progress and outlook of lithography for semiconductor IC},
author = {Burn J. Lin and R. G. Liu},
year = {2009},
doi = {10.1109/CICC.2009.5280903},
url = {http://dx.doi.org/10.1109/CICC.2009.5280903},
researchr = {https://researchr.org/publication/LinL09-31},
cites = {0},
citedby = {0},
pages = {133-140},
booktitle = {IEEE Custom Integrated Circuits Conference, CICC 2009, San Jose, California, USA, 13-16 September, 2009, Proceedings},
publisher = {IEEE},
isbn = {978-1-4244-4071-9},
}