Void formation over limiting current density and impurity analysis of TSV fabricated by constant-current pulse-reverse modulation

Nay Lin, Jianmin Miao, Pradeep Dixit. Void formation over limiting current density and impurity analysis of TSV fabricated by constant-current pulse-reverse modulation. Microelectronics Reliability, 53(12):1943-1953, 2013. [doi]

@article{LinMD13,
  title = {Void formation over limiting current density and impurity analysis of TSV fabricated by constant-current pulse-reverse modulation},
  author = {Nay Lin and Jianmin Miao and Pradeep Dixit},
  year = {2013},
  doi = {10.1016/j.microrel.2013.04.003},
  url = {http://dx.doi.org/10.1016/j.microrel.2013.04.003},
  researchr = {https://researchr.org/publication/LinMD13},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {53},
  number = {12},
  pages = {1943-1953},
}