Data Efficient Lithography Modeling with Residual Neural Networks and Transfer Learning - researchr publication authors

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Yibo Lin, Yuki Watanabe, Taiki Kimura, Tetsuaki Matsunawa, Shigeki Nojima, Meng Li 0004, David Z. Pan. Data Efficient Lithography Modeling with Residual Neural Networks and Transfer Learning. In Chris Chu, Ismail Bustany, editors, Proceedings of the 2018 International Symposium on Physical Design, ISPD 2018, Monterey, CA, USA, March 25-28, 2018. pages 82-89, ACM, 2018. [doi]

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