Yibo Lin, Yuki Watanabe, Taiki Kimura, Tetsuaki Matsunawa, Shigeki Nojima, Meng Li 0004, David Z. Pan. Data Efficient Lithography Modeling with Residual Neural Networks and Transfer Learning. In Chris Chu, Ismail Bustany, editors, Proceedings of the 2018 International Symposium on Physical Design, ISPD 2018, Monterey, CA, USA, March 25-28, 2018. pages 82-89, ACM, 2018. [doi]
@inproceedings{LinWKMN0P18,
title = {Data Efficient Lithography Modeling with Residual Neural Networks and Transfer Learning},
author = {Yibo Lin and Yuki Watanabe and Taiki Kimura and Tetsuaki Matsunawa and Shigeki Nojima and Meng Li 0004 and David Z. Pan},
year = {2018},
doi = {10.1145/3177540.3178242},
url = {http://doi.acm.org/10.1145/3177540.3178242},
researchr = {https://researchr.org/publication/LinWKMN0P18},
cites = {0},
citedby = {0},
pages = {82-89},
booktitle = {Proceedings of the 2018 International Symposium on Physical Design, ISPD 2018, Monterey, CA, USA, March 25-28, 2018},
editor = {Chris Chu and Ismail Bustany},
publisher = {ACM},
}