Fabrication of deep lateral single-crystal-silicon blaze micro-grating by Inductively-Coupled-Plasma Reactive Ion Etch

Y.-H. Lin, C. J. Weng, C.-Y. Su, W. Hsu. Fabrication of deep lateral single-crystal-silicon blaze micro-grating by Inductively-Coupled-Plasma Reactive Ion Etch. In 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012, Kyoto, Japan, March 5-8, 2012. pages 689-692, IEEE, 2012. [doi]

Authors

Y.-H. Lin

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C. J. Weng

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C.-Y. Su

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W. Hsu

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