Y.-H. Lin, C. J. Weng, C.-Y. Su, W. Hsu. Fabrication of deep lateral single-crystal-silicon blaze micro-grating by Inductively-Coupled-Plasma Reactive Ion Etch. In 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012, Kyoto, Japan, March 5-8, 2012. pages 689-692, IEEE, 2012. [doi]
@inproceedings{LinWSH12-0,
title = {Fabrication of deep lateral single-crystal-silicon blaze micro-grating by Inductively-Coupled-Plasma Reactive Ion Etch},
author = {Y.-H. Lin and C. J. Weng and C.-Y. Su and W. Hsu},
year = {2012},
doi = {10.1109/NEMS.2012.6196869},
url = {http://dx.doi.org/10.1109/NEMS.2012.6196869},
researchr = {https://researchr.org/publication/LinWSH12-0},
cites = {0},
citedby = {0},
pages = {689-692},
booktitle = {7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012, Kyoto, Japan, March 5-8, 2012},
publisher = {IEEE},
isbn = {978-1-4673-1122-9},
}