An Adversarial Active Sampling-Based Data Augmentation Framework for AI-Assisted Lithography Modeling - researchr publication authors

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Mingjie Liu, Haoyu Yang, Brucek Khailany, Haoxing Ren. An Adversarial Active Sampling-Based Data Augmentation Framework for AI-Assisted Lithography Modeling. In IEEE/ACM International Conference on Computer Aided Design, ICCAD 2023, San Francisco, CA, USA, October 28 - Nov. 2, 2023. pages 1-9, IEEE, 2023. [doi]

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