A Performance Comparative at Low Temperatures of Two FET Technologies: 65 nm and 14 nm

Omar López-L, I. Martínez, D. Durini, E. A. Gutiéirrez-D, D. Ferrusca, M. Velázquez, F. J. De la Hidalga, V. Gómez. A Performance Comparative at Low Temperatures of Two FET Technologies: 65 nm and 14 nm. In 17th International Conference on Electrical Engineering, Computing Science and Automatic Control, CCE 2020, Mexico City, Mexico, November 11-13, 2020. pages 1-4, IEEE, 2020. [doi]

@inproceedings{Lopez-LMDGFVHG20,
  title = {A Performance Comparative at Low Temperatures of Two FET Technologies: 65 nm and 14 nm},
  author = {Omar López-L and I. Martínez and D. Durini and E. A. Gutiéirrez-D and D. Ferrusca and M. Velázquez and F. J. De la Hidalga and V. Gómez},
  year = {2020},
  doi = {10.1109/CCE50788.2020.9299192},
  url = {https://doi.org/10.1109/CCE50788.2020.9299192},
  researchr = {https://researchr.org/publication/Lopez-LMDGFVHG20},
  cites = {0},
  citedby = {0},
  pages = {1-4},
  booktitle = {17th International Conference on Electrical Engineering, Computing Science and Automatic Control, CCE 2020, Mexico City, Mexico, November 11-13, 2020},
  publisher = {IEEE},
  isbn = {978-1-7281-8987-1},
}