A study of thermoplastic properties of a novel photoresist

Kevin Lou, Gene Sheu, Shao-Ming Yang, Pradhana Jati Budhi Laksana. A study of thermoplastic properties of a novel photoresist. In 10th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2015, Xi'an, China, April 7-11, 2015. pages 95-98, IEEE, 2015. [doi]

Abstract

Abstract is missing.