Tuneable electrical properties of hafnium aluminate gate dielectrics deposited by metal organic chemical vapour deposition

Y. Lu, Octavian Buiu, Steve Hall, I. Z. Mitrovic, W. Davey, R. J. Potter, P. R. Chalker. Tuneable electrical properties of hafnium aluminate gate dielectrics deposited by metal organic chemical vapour deposition. Microelectronics Reliability, 47(4-5):722-725, 2007. [doi]

Abstract

Abstract is missing.