ReRAM Device and Circuit Co-Design Challenges in Nano-scale CMOS Technology

Lu Lu, Ju Eon Kim, Vishal Sharma, Tony Tae-Hyoung Kim. ReRAM Device and Circuit Co-Design Challenges in Nano-scale CMOS Technology. In 2020 IEEE Asia Pacific Conference on Circuits and Systems, APCCAS 2020, Ha Long, Vietnam, December 8-10, 2020. pages 213-216, IEEE, 2020. [doi]

@inproceedings{LuKSK20,
  title = {ReRAM Device and Circuit Co-Design Challenges in Nano-scale CMOS Technology},
  author = {Lu Lu and Ju Eon Kim and Vishal Sharma and Tony Tae-Hyoung Kim},
  year = {2020},
  doi = {10.1109/APCCAS50809.2020.9301707},
  url = {https://doi.org/10.1109/APCCAS50809.2020.9301707},
  researchr = {https://researchr.org/publication/LuKSK20},
  cites = {0},
  citedby = {0},
  pages = {213-216},
  booktitle = {2020 IEEE Asia Pacific Conference on Circuits and Systems, APCCAS 2020, Ha Long, Vietnam, December 8-10, 2020},
  publisher = {IEEE},
  isbn = {978-1-7281-9396-0},
}