Investigation on Gate Capacitances Fluctuation Due to Work-Function Variation in Metal-Gate FinFETs

Wei-feng Lü, Mi Lin, Haipeng Zhang. Investigation on Gate Capacitances Fluctuation Due to Work-Function Variation in Metal-Gate FinFETs. In Antonio J. Tallón-Ballesteros, Kaicheng Li, editors, Fuzzy Systems and Data Mining III - Proceedings of FSDM 2017 [Hualien, Taiwan, November 2017]. Volume 299 of Frontiers in Artificial Intelligence and Applications, pages 398-403, IOS Press, 2017. [doi]

Abstract

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