Strong Electro-Absorption in GeSi Epitaxy on Silicon-on-Insulator (SOI)

Ying Luo, Xuezhe Zheng, Guoliang Li, Ivan Shubin, Hiren Thacker, Jin Yao, Jin-Hyoung Lee, Dazeng Feng, Joan Fong, Cheng-Chih Kung, Shirong Liao, Roshanak Shafiiha, Mehdi Asghari, Kannan Raj, Ashok V. Krishnamoorthy, John E. Cunningham. Strong Electro-Absorption in GeSi Epitaxy on Silicon-on-Insulator (SOI). Micromachines, 3(2):345-363, 2012. [doi]

@article{LuoZLSTYLFFKLSARKC12,
  title = {Strong Electro-Absorption in GeSi Epitaxy on Silicon-on-Insulator (SOI)},
  author = {Ying Luo and Xuezhe Zheng and Guoliang Li and Ivan Shubin and Hiren Thacker and Jin Yao and Jin-Hyoung Lee and Dazeng Feng and Joan Fong and Cheng-Chih Kung and Shirong Liao and Roshanak Shafiiha and Mehdi Asghari and Kannan Raj and Ashok V. Krishnamoorthy and John E. Cunningham},
  year = {2012},
  doi = {10.3390/mi3020345},
  url = {http://dx.doi.org/10.3390/mi3020345},
  researchr = {https://researchr.org/publication/LuoZLSTYLFFKLSARKC12},
  cites = {0},
  citedby = {0},
  journal = {Micromachines},
  volume = {3},
  number = {2},
  pages = {345-363},
}