Beibei Ma, Seán F. McLoone, John Ringwood. Tracking plasma etch process variations using principal component analysis of oes data. In Janan Zaytoon, Jean-Louis Ferrier, Juan Andrade-Cetto, Joaquim Filipe, editors, ICINCO 2007, Proceedings of the Fourth International Conference on Informatics in Control, Automation and Robotics, Signal Processing, Systems Modeling and Control, Angers, France, May 9-12, 2007. pages 361-364, INSTICC Press, 2007.
@inproceedings{MaMR07,
title = {Tracking plasma etch process variations using principal component analysis of oes data},
author = {Beibei Ma and Seán F. McLoone and John Ringwood},
year = {2007},
tags = {analysis, data-flow analysis},
researchr = {https://researchr.org/publication/MaMR07},
cites = {0},
citedby = {0},
pages = {361-364},
booktitle = {ICINCO 2007, Proceedings of the Fourth International Conference on Informatics in Control, Automation and Robotics, Signal Processing, Systems Modeling and Control, Angers, France, May 9-12, 2007},
editor = {Janan Zaytoon and Jean-Louis Ferrier and Juan Andrade-Cetto and Joaquim Filipe},
publisher = {INSTICC Press},
isbn = {978-972-8865-84-9},
}