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Tracking plasma etch process variations using principal component analysis of oes data

Beibei Ma, Seán F. McLoone, John Ringwood. Tracking plasma etch process variations using principal component analysis of oes data. In Janan Zaytoon, Jean-Louis Ferrier, Juan Andrade-Cetto, Joaquim Filipe, editors, ICINCO 2007, Proceedings of the Fourth International Conference on Informatics in Control, Automation and Robotics, Signal Processing, Systems Modeling and Control, Angers, France, May 9-12, 2007. pages 361-364, INSTICC Press, 2007.

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