Investigation of degradation mechanisms in low-voltage p-channel power MOSFETs under High Temperature Gate Bias stress

Paolo Magnone, Giacomo Barletta, A. Magrì. Investigation of degradation mechanisms in low-voltage p-channel power MOSFETs under High Temperature Gate Bias stress. Microelectronics Reliability, 88:438-442, 2018. [doi]

@article{MagnoneBM18,
  title = {Investigation of degradation mechanisms in low-voltage p-channel power MOSFETs under High Temperature Gate Bias stress},
  author = {Paolo Magnone and Giacomo Barletta and A. Magrì},
  year = {2018},
  doi = {10.1016/j.microrel.2018.06.029},
  url = {https://doi.org/10.1016/j.microrel.2018.06.029},
  researchr = {https://researchr.org/publication/MagnoneBM18},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {88},
  pages = {438-442},
}