Eliminating Exposure Bias and Metric Mismatch in Multiple Object Tracking

Andrii Maksai, Pascal Fua. Eliminating Exposure Bias and Metric Mismatch in Multiple Object Tracking. In IEEE Conference on Computer Vision and Pattern Recognition, CVPR 2019, Long Beach, CA, USA, June 16-20, 2019. pages 4639-4648, Computer Vision Foundation / IEEE, 2019. [doi]

Abstract

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