Resonant MEMS Pressure Sensor in 180 nm CMOS Technology Obtained by BEOL Isotropic Etching

Diana Mata-Hernandez, Daniel Fernández, Saoni Banerji, Jordi Madrenas. Resonant MEMS Pressure Sensor in 180 nm CMOS Technology Obtained by BEOL Isotropic Etching. Sensors, 20(21):6037, 2020. [doi]

@article{Mata-HernandezF20,
  title = {Resonant MEMS Pressure Sensor in 180 nm CMOS Technology Obtained by BEOL Isotropic Etching},
  author = {Diana Mata-Hernandez and Daniel Fernández and Saoni Banerji and Jordi Madrenas},
  year = {2020},
  doi = {10.3390/s20216037},
  url = {https://doi.org/10.3390/s20216037},
  researchr = {https://researchr.org/publication/Mata-HernandezF20},
  cites = {0},
  citedby = {0},
  journal = {Sensors},
  volume = {20},
  number = {21},
  pages = {6037},
}