Resonant MEMS Pressure Sensor in 180 nm CMOS Technology Obtained by BEOL Isotropic Etching

Diana Mata-Hernandez, Daniel Fernández, Saoni Banerji, Jordi Madrenas. Resonant MEMS Pressure Sensor in 180 nm CMOS Technology Obtained by BEOL Isotropic Etching. Sensors, 20(21):6037, 2020. [doi]

Abstract

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