Degradation of high-K LA::2::O::3:: gate dielectrics using progressive electrical stress

E. Miranda, J. Molina, Y. Kim, H. Iwai. Degradation of high-K LA::2::O::3:: gate dielectrics using progressive electrical stress. Microelectronics Reliability, 45(9-11):1365-1369, 2005. [doi]

Authors

E. Miranda

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J. Molina

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Y. Kim

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H. Iwai

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