Soodeh Aghli Moghaddam, Nasser Masoumi. Analysis and simulation of a novel gradually low-K dielectric structure for crosstalk reduction in VLSI. Microelectronics Journal, 39(12):1751-1760, 2008. [doi]
@article{MoghaddamM08,
title = {Analysis and simulation of a novel gradually low-K dielectric structure for crosstalk reduction in VLSI},
author = {Soodeh Aghli Moghaddam and Nasser Masoumi},
year = {2008},
doi = {10.1016/j.mejo.2008.08.008},
url = {http://dx.doi.org/10.1016/j.mejo.2008.08.008},
tags = {analysis},
researchr = {https://researchr.org/publication/MoghaddamM08},
cites = {0},
citedby = {0},
journal = {Microelectronics Journal},
volume = {39},
number = {12},
pages = {1751-1760},
}