On the Throughput of Clustered Photolithography Tools: Wafer Advancement and Intrinsic Equipment Loss

James R. Morrison, Maruthi Kumar Mutnuri. On the Throughput of Clustered Photolithography Tools: Wafer Advancement and Intrinsic Equipment Loss. In IEEE Conference on Automation Science and Engineering, CASE 2007, September 22-25, 2007. Scottsdale, Arizona, USA. pages 88-93, IEEE, 2007. [doi]

Abstract

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