Process Mapping and Functional Correlation in Surface Metrology: A Novel Clustering Application

B. Muralikrishnan, K. Najarian, J. Raja. Process Mapping and Functional Correlation in Surface Metrology: A Novel Clustering Application. In ICPR (1). pages 29-32, 2002. [doi]

Authors

B. Muralikrishnan

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K. Najarian

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J. Raja

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