Process Mapping and Functional Correlation in Surface Metrology: A Novel Clustering Application

B. Muralikrishnan, K. Najarian, J. Raja. Process Mapping and Functional Correlation in Surface Metrology: A Novel Clustering Application. In ICPR (1). pages 29-32, 2002. [doi]

@inproceedings{MuralikrishnanNR02,
  title = {Process Mapping and Functional Correlation in Surface Metrology: A Novel Clustering Application},
  author = {B. Muralikrishnan and K. Najarian and J. Raja},
  year = {2002},
  doi = {10.1109/ICPR.2002.1044581},
  url = {http://doi.ieeecomputersociety.org/10.1109/ICPR.2002.1044581},
  researchr = {https://researchr.org/publication/MuralikrishnanNR02},
  cites = {0},
  citedby = {0},
  pages = {29-32},
  booktitle = {ICPR (1)},
}