G. Néau, F. Martinez, M. Valenza, J. C. Vildeuil, E. Vincent, Frédéric Boeuf, F. Payet, K. Rochereau. Impact of strained-channel n-MOSFETs with a SiGe virtual substrate on dielectric interface quality evaluated by low frequency noise measurements. Microelectronics Reliability, 47(4-5):567-572, 2007. [doi]
@article{NeauMVVVBPR07,
title = {Impact of strained-channel n-MOSFETs with a SiGe virtual substrate on dielectric interface quality evaluated by low frequency noise measurements},
author = {G. Néau and F. Martinez and M. Valenza and J. C. Vildeuil and E. Vincent and Frédéric Boeuf and F. Payet and K. Rochereau},
year = {2007},
doi = {10.1016/j.microrel.2007.01.079},
url = {http://dx.doi.org/10.1016/j.microrel.2007.01.079},
tags = {C++},
researchr = {https://researchr.org/publication/NeauMVVVBPR07},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {47},
number = {4-5},
pages = {567-572},
}