K. L. Ng, Nian Zhan, C. W. Kok, M.-C. Poon, Hei Wong. Electrical characterization of the hafnium oxide prepared by direct sputtering of Hf in oxygen with rapid thermal annealing. Microelectronics Reliability, 43(8):1289-1293, 2003. [doi]
@article{NgZKPW03,
title = {Electrical characterization of the hafnium oxide prepared by direct sputtering of Hf in oxygen with rapid thermal annealing},
author = {K. L. Ng and Nian Zhan and C. W. Kok and M.-C. Poon and Hei Wong},
year = {2003},
doi = {10.1016/S0026-2714(03)00141-0},
url = {http://dx.doi.org/10.1016/S0026-2714(03)00141-0},
tags = {C++},
researchr = {https://researchr.org/publication/NgZKPW03},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {43},
number = {8},
pages = {1289-1293},
}