Input Perturbation Reduces Exposure Bias in Diffusion Models

Mang Ning, Enver Sangineto, Angelo Porrello, Simone Calderara, Rita Cucchiara. Input Perturbation Reduces Exposure Bias in Diffusion Models. In Andreas Krause 0001, Emma Brunskill, KyungHyun Cho, Barbara Engelhardt, Sivan Sabato, Jonathan Scarlett, editors, International Conference on Machine Learning, ICML 2023, 23-29 July 2023, Honolulu, Hawaii, USA. Volume 202 of Proceedings of Machine Learning Research, pages 26245-26265, PMLR, 2023. [doi]

@inproceedings{NingSPCC23,
  title = {Input Perturbation Reduces Exposure Bias in Diffusion Models},
  author = {Mang Ning and Enver Sangineto and Angelo Porrello and Simone Calderara and Rita Cucchiara},
  year = {2023},
  url = {https://proceedings.mlr.press/v202/ning23a.html},
  researchr = {https://researchr.org/publication/NingSPCC23},
  cites = {0},
  citedby = {0},
  pages = {26245-26265},
  booktitle = {International Conference on Machine Learning, ICML 2023, 23-29 July 2023, Honolulu, Hawaii, USA},
  editor = {Andreas Krause 0001 and Emma Brunskill and KyungHyun Cho and Barbara Engelhardt and Sivan Sabato and Jonathan Scarlett},
  volume = {202},
  series = {Proceedings of Machine Learning Research},
  publisher = {PMLR},
}