Input Perturbation Reduces Exposure Bias in Diffusion Models

Mang Ning, Enver Sangineto, Angelo Porrello, Simone Calderara, Rita Cucchiara. Input Perturbation Reduces Exposure Bias in Diffusion Models. In Andreas Krause 0001, Emma Brunskill, KyungHyun Cho, Barbara Engelhardt, Sivan Sabato, Jonathan Scarlett, editors, International Conference on Machine Learning, ICML 2023, 23-29 July 2023, Honolulu, Hawaii, USA. Volume 202 of Proceedings of Machine Learning Research, pages 26245-26265, PMLR, 2023. [doi]

Abstract

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