Modeling the charge transport mechanism in amorphous Al::2::O::3:: with multiphonon trap ionization effect

Yu. N. Novikov, A. V. Vishnyakov, V. A. Gritsenko, K. A. Nasyrov, Hei Wong. Modeling the charge transport mechanism in amorphous Al::2::O::3:: with multiphonon trap ionization effect. Microelectronics Reliability, 50(2):207-210, 2010. [doi]

@article{NovikovVGNW10,
  title = {Modeling the charge transport mechanism in amorphous Al::2::O::3:: with multiphonon trap ionization effect},
  author = {Yu. N. Novikov and A. V. Vishnyakov and V. A. Gritsenko and K. A. Nasyrov and Hei Wong},
  year = {2010},
  doi = {10.1016/j.microrel.2009.11.004},
  url = {http://dx.doi.org/10.1016/j.microrel.2009.11.004},
  tags = {modeling},
  researchr = {https://researchr.org/publication/NovikovVGNW10},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {50},
  number = {2},
  pages = {207-210},
}