Study of the impact of electromigration on integrated circuit performance and reliability at design level

R. O. Nunes, R. L. de Orio. Study of the impact of electromigration on integrated circuit performance and reliability at design level. Microelectronics Reliability, 76:75-80, 2017. [doi]

Authors

R. O. Nunes

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R. L. de Orio

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