R. O. Nunes, R. L. de Orio. Study of the impact of electromigration on integrated circuit performance and reliability at design level. Microelectronics Reliability, 76:75-80, 2017. [doi]
@article{NunesO17,
title = {Study of the impact of electromigration on integrated circuit performance and reliability at design level},
author = {R. O. Nunes and R. L. de Orio},
year = {2017},
doi = {10.1016/j.microrel.2017.06.027},
url = {https://doi.org/10.1016/j.microrel.2017.06.027},
researchr = {https://researchr.org/publication/NunesO17},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {76},
pages = {75-80},
}