Teresa Oh. Correlation between Low Polarization and Roughness in Low-k SiOC Thin Films by Chemical Vapor Deposition. In Tai-Hoon Kim, Hojjat Adeli, Hyun-seob Cho, Osvaldo Gervasi, Stephen S. Yau, Byeong Ho Kang, L. Javier García-Villalba, editors, Grid and Distributed Computing - International Conference, GDC 2011, Held as Part of the Future Generation Information Technology Conference, FGIT 2011, Jeju Island, Korea, December 8-10, 2011. Proceedings. Volume 261 of Communications in Computer and Information Science, pages 155-160, Springer, 2011. [doi]
@inproceedings{Oh11-4,
title = {Correlation between Low Polarization and Roughness in Low-k SiOC Thin Films by Chemical Vapor Deposition},
author = {Teresa Oh},
year = {2011},
doi = {10.1007/978-3-642-27180-9_19},
url = {http://dx.doi.org/10.1007/978-3-642-27180-9_19},
researchr = {https://researchr.org/publication/Oh11-4},
cites = {0},
citedby = {0},
pages = {155-160},
booktitle = {Grid and Distributed Computing - International Conference, GDC 2011, Held as Part of the Future Generation Information Technology Conference, FGIT 2011, Jeju Island, Korea, December 8-10, 2011. Proceedings},
editor = {Tai-Hoon Kim and Hojjat Adeli and Hyun-seob Cho and Osvaldo Gervasi and Stephen S. Yau and Byeong Ho Kang and L. Javier García-Villalba},
volume = {261},
series = {Communications in Computer and Information Science},
publisher = {Springer},
isbn = {978-3-642-27179-3},
}