Correlation between Low Polarization and Roughness in Low-k SiOC Thin Films by Chemical Vapor Deposition

Teresa Oh. Correlation between Low Polarization and Roughness in Low-k SiOC Thin Films by Chemical Vapor Deposition. In Tai-Hoon Kim, Hojjat Adeli, Hyun-seob Cho, Osvaldo Gervasi, Stephen S. Yau, Byeong Ho Kang, L. Javier GarcĂ­a-Villalba, editors, Grid and Distributed Computing - International Conference, GDC 2011, Held as Part of the Future Generation Information Technology Conference, FGIT 2011, Jeju Island, Korea, December 8-10, 2011. Proceedings. Volume 261 of Communications in Computer and Information Science, pages 155-160, Springer, 2011. [doi]

Abstract

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