Deep-amorphization and solid-phase epitaxial regrowth processes for hybrid orientation technologies in SOI MOSFETs with thin body

A. Ohata, Y. Bae, Sorin Cristoloveanu, Thomas Signamarcheix, J. Widiez, B. Ghyselen, Olivier Faynot, Laurent Clavelier. Deep-amorphization and solid-phase epitaxial regrowth processes for hybrid orientation technologies in SOI MOSFETs with thin body. Microelectronics Reliability, 52(11):2602-2608, 2012. [doi]

Abstract

Abstract is missing.