Kenji Ohmori, Ranga Hettiarachchi, Keisaku Yamada. Effect of substrate bias on frequency dependence of MOSFET noise intensity. In Proceedings of the 2012 European Solid-State Device Research Conference, ESSDERC 2012, Bordeaux, France, September 17-21, 2012. pages 342-345, IEEE, 2012. [doi]
@inproceedings{OhmoriHY12, title = {Effect of substrate bias on frequency dependence of MOSFET noise intensity}, author = {Kenji Ohmori and Ranga Hettiarachchi and Keisaku Yamada}, year = {2012}, doi = {10.1109/ESSDERC.2012.6343403}, url = {http://dx.doi.org/10.1109/ESSDERC.2012.6343403}, researchr = {https://researchr.org/publication/OhmoriHY12}, cites = {0}, citedby = {0}, pages = {342-345}, booktitle = {Proceedings of the 2012 European Solid-State Device Research Conference, ESSDERC 2012, Bordeaux, France, September 17-21, 2012}, publisher = {IEEE}, isbn = {978-1-4673-1707-8}, }