Semiu A. Olowogemo, Ahmed Yiwere, Bor-Tyng Lin, Hao Qiu, William H. Robinson, Daniel B. Limbrick. Electrical Masking Improvement with Standard Logic Cell Synthesis Using 45 nm Technology Node. In 63rd IEEE International Midwest Symposium on Circuits and Systems, MWSCAS 2020, Springfield, MA, USA, August 9-12, 2020. pages 619-622, IEEE, 2020. [doi]
No references recorded for this publication.
No citations of this publication recorded.