Time-dependent dielectric breakdown statistics in SiO2 and HfO2 dielectrics: Insights from a multi-scale modeling approach

Andrea Padovani, Luca Larcher. Time-dependent dielectric breakdown statistics in SiO2 and HfO2 dielectrics: Insights from a multi-scale modeling approach. In IEEE International Reliability Physics Symposium, IRPS 2018, Burlingame, CA, USA, March 11-15, 2018. pages 3, IEEE, 2018. [doi]

@inproceedings{PadovaniL18,
  title = {Time-dependent dielectric breakdown statistics in SiO2 and HfO2 dielectrics: Insights from a multi-scale modeling approach},
  author = {Andrea Padovani and Luca Larcher},
  year = {2018},
  doi = {10.1109/IRPS.2018.8353552},
  url = {https://doi.org/10.1109/IRPS.2018.8353552},
  researchr = {https://researchr.org/publication/PadovaniL18},
  cites = {0},
  citedby = {0},
  pages = {3},
  booktitle = {IEEE International Reliability Physics Symposium, IRPS 2018, Burlingame, CA, USA, March 11-15, 2018},
  publisher = {IEEE},
  isbn = {978-1-5386-5479-8},
}