Risk assessment of the crack propagation and delamination of the Cu-to-Cu direct bonded (CuDB) interface

Ah-Young Park, Satish C. Chaparala, SeungBae Park. Risk assessment of the crack propagation and delamination of the Cu-to-Cu direct bonded (CuDB) interface. Microelectronics Reliability, 66:113-121, 2016. [doi]

Abstract

Abstract is missing.