Controlled Wafer Release in Clustered Photolithography Tools: Flexible Flow Line Job Release Scheduling and an LMOLP Heuristic

Kyungsu Park, James R. Morrison. Controlled Wafer Release in Clustered Photolithography Tools: Flexible Flow Line Job Release Scheduling and an LMOLP Heuristic. IEEE T. Automation Science and Engineering, 12(2):642-655, 2015. [doi]

Abstract

Abstract is missing.