The characteristics of glass deep dry etching process with a single PR mask

Tag Gyu Park, Junggi Min, Dong-Chul Han, Yeongtaek Oh, Wonjin Seo. The characteristics of glass deep dry etching process with a single PR mask. In 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011, Kaohsiung, Taiwan, February 20-23, 2011. pages 885-888, IEEE, 2011. [doi]

Abstract

Abstract is missing.