Study on a Novel Peeling of Nano-Particle (PNP) Process for Localized Material Removal on a 4H-SiC Surface by Controllable Magnetic Field

Thitipat Permpatdechakul, Panart Khajornrungruang, Keisuke Suzuki, Shotaro Kutomi. Study on a Novel Peeling of Nano-Particle (PNP) Process for Localized Material Removal on a 4H-SiC Surface by Controllable Magnetic Field. IJAT, 17(4):410-421, 2023. [doi]

Abstract

Abstract is missing.