P. K. S. Prakash, Seán F. McLoone. Plasma etch process virtual metrology using aggregative linear regression. In Ajith Abraham, Hongbo Liu, Fuchun Sun, Chen Guo, Seán F. McLoone, Emilio Corchado, editors, Third International Conference of Soft Computing and Pattern Recognition, SoCPaR 2011, Dalian, China, October 14-16, 2011. pages 538-543, IEEE, 2011. [doi]
Abstract is missing.